Zanon is deeply involved in the Shanghai High repetition rate XFEL aNd Extreme light facility (SHINE) project with the fabrication and treatment of 60 1.3 GHz cavities.
Indeed, SHINE (http://english.sari.cas.cn/Research/facilities/202106/t20210629_273226.html) will include a hard X-ray free electron laser and an 100PW intense laser facilities with overall length of 3.1km and it is led by theΒ ShanghaiTech University (ShanghaiTech, https://www.shanghaitech.edu.cn).
Last week Dr. Hongtao Hou and Dr. Xiaoyun Pu from SHINE visited Zanon Research & Innovation and this was an important occasion to discuss about the progress in the cavities production and for the future of our collaboration.
We really would like to thank them for them for the visit!